The range of the equipment for making the patterns on photomasks includes pattern generators, automatic inspection systems, laser photomask repair systems and photorepeaters.Development and production of the all models range is based on the long-term design and production experience of our company using the most update technology.

EM-5434M stepper is designed to enable a lithography process in the production of PCBs (IC Substrate) for flip-chip packaging (BGA/CSP). The universality of the tool lies in capability to work with thick photoresist (50µm) and to control the resist side wall angle.

EМ-5534 stepper aligns and enables the projection transfer of the reticle image in 1:1 ratio onto the photoresist coated wafer and the further step-and-repeat imaging over the entire wafer. EМ-5534 stepper is designed to enable the lithography process in thick (up to 200 μm) photoresist layers. It can be employed in semiconductor die solder and gold bumping processes, as well as in photolithography processes for MEMS.