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Optical coatings
Enlightening coatings are used in a wide range of optoelectronic devices: thermal imaging systems, laser technology, spectral and spectrophotometric equipment, instruments for monitoring and studying the environment, medical equipment, and monitoring devices.
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Shvabe Description
Used technologies:
- technology of applying a broadband antireflection coating on the spectral range from 3 to 5 μm for optical elements made of silicon, germanium and zinc selenide by the method of electron beam evaporation in vacuum;
- technology of applying a broadband antireflection coating on the spectral range from 8 to 11 μm for optical elements from germanium and zinc selenide by the method of electron beam evaporation in vacuum;
- technology of applying achromatic antireflection coating on the spectral range from 0.4 to 0.9 microns for optical elements made of glass by the method of electron beam evaporation in vacuum;
- technology of applying a single-wave antireflection coating to the laser wavelengths of the visible and near-IR spectral ranges for optical elements made of glass by the method of electron beam evaporation in vacuum;
- technology of applying dual-band antireflection coatings on the spectral range of 0.45 - 0.75 μm and a wavelength of 1.06 / 1.54 μm for optical elements made of glass by the method of electron beam evaporation in vacuum.
Substrate material
Operating spectral range, micron
Average coefficient of reflection, not more,%
Silicon, germanium
3 ... 5
1.0
Germanium, CVD-ZnSe
8 ... 12
1.0
Glass
0.4 ... 0.9
0.8
Glass 0.53; 0.63; 1.06; 1.54
0.1
Glass
0.45 ... 0.75 and 1.06
0.8
Manufacturer JSC "NPO GIPO"
- technology of applying a broadband antireflection coating on the spectral range from 3 to 5 μm for optical elements made of silicon, germanium and zinc selenide by the method of electron beam evaporation in vacuum;
- technology of applying a broadband antireflection coating on the spectral range from 8 to 11 μm for optical elements from germanium and zinc selenide by the method of electron beam evaporation in vacuum;
- technology of applying achromatic antireflection coating on the spectral range from 0.4 to 0.9 microns for optical elements made of glass by the method of electron beam evaporation in vacuum;
- technology of applying a single-wave antireflection coating to the laser wavelengths of the visible and near-IR spectral ranges for optical elements made of glass by the method of electron beam evaporation in vacuum;
- technology of applying dual-band antireflection coatings on the spectral range of 0.45 - 0.75 μm and a wavelength of 1.06 / 1.54 μm for optical elements made of glass by the method of electron beam evaporation in vacuum.
Substrate material
Operating spectral range, micron
Average coefficient of reflection, not more,%
Silicon, germanium
3 ... 5
1.0
Germanium, CVD-ZnSe
8 ... 12
1.0
Glass
0.4 ... 0.9
0.8
Glass 0.53; 0.63; 1.06; 1.54
0.1
Glass
0.45 ... 0.75 and 1.06
0.8
Manufacturer JSC "NPO GIPO"